INCREASE OF INVERSE BETA OF SI TRANSISTORS DUE TO LOW TEMPERATURE TREATMENTS
| dc.contributor.author | KENDALL, DL | |
| dc.contributor.author | ACEVES, M | |
| dc.date.accessioned | 2026-05-28T16:57:03Z | |
| dc.date.issued | 1979 | |
| dc.description.paginacion | 282 - 283 | |
| dc.description.procedencia | EXT | |
| dc.format.discurso | Artículo | |
| dc.format.extent | 2 | |
| dc.identifier.issn | 0013-5194 | |
| dc.identifier.uri | https://ahcm.cinvestav.mx/handle/ahcm/30586 | |
| dc.language.iso | Inglés | |
| dc.numero.secuencia | 30583 | |
| dc.relation.ispartofseries | Vol. 15 No. 10 | |
| dc.source.revistafuente | ELECTRONICS LETTERS | |
| dc.subject | INCREASE, INVERSE BETA, SI TRANSISTORS, LOWTEMPERATURE TREATMENTS | |
| dc.subject.categoriaprincipal | CIENCIAS TECNOLOGICAS | |
| dc.subject.disciplina | TECNOLOGIA ELECTRONICA | |
| dc.title | INCREASE OF INVERSE BETA OF SI TRANSISTORS DUE TO LOW TEMPERATURE TREATMENTS | |
| dc.title.alternative | ELECTRON LETT |
